Everyone in modern society is enjoying the convenience brought to us by vacuum technology. For example: the secret of the heat preservation of the thermos is that there is a vacuum space in the wall of the bottle, which reduces heat conduction to maintain the temperature in the pot; fluorescent lamps, street lamps, and car lights are also in a vacuum state, otherwise they cannot emit light; TVs, computer monitors, etc. Also inseparable from the vacuum. In order to improve the light transmittance of glasses, video cameras, and camera lenses, the optical film coated on the surface is also applied with vacuum technology. However, if you think of packaged food in the supermarket and these everyday common senses when it comes to vacuum, you are dead wrong.
Thin film growth technology represented by molecular beam epitaxy is an important means for the development of new materials. The thin film material is evaporated or sublimated after being placed in the evaporation source. In an ultra-high vacuum environment, the atoms or molecules of the thin film material can fly long distances and reach The film is formed on the substrate; and because there is less residual gas, the film formed on the surface of the substrate has high purity.
(1) To dope the corresponding other elements on the silicon wafer;
(2) Complex metal thin films and insulating films are to be formed when producing integrated circuits;
(3) Complicated processes such as surface etching treatment are required.
If the vacuum level during the production process is not enough, there will be serious consequences after dust or oil droplets get on the surface. The width of the thin line in the integrated circuit is 1/3 of the diameter of the smoke particles exhaled during smoking, and it is nearly 1/10,000 of the diameter of a grain of dust. For integrated circuits, even if there is a particle of smog falling, it is like a large plane parked on the road, preventing electrons from passing through or causing a short circuit.
In an extremely high vacuum environment, the clean surface of the material is obtained by high-temperature annealing or combined with ion sputtering. At this time, the surface does not adsorb any other molecules or atoms. Using cutting-edge surface analysis experimental methods such as scanning tunneling electron microscopy, the atomic arrangement and electronic state of the material surface can be seen.
Electrons (or other charged particles) have to be accelerated to near the speed of light. If the electron storage ring is not in an ultra-high vacuum state, the electrons will collide with molecules or atoms in it, thereby rapidly decaying. In addition, the nuclear fusion reaction must reach a high temperature of hundreds of millions of degrees, and an extremely high vacuum environment is the basic prerequisite for the system to work.
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