Liquid ring vacuum pump for Wafer Cleaning Equipment

The wafer cleaning system includes a cleaning chamber for cleaning wafers, and a wafer placement position is provided in the cleaning chamber for placing wafers, and the wafer placement position can be rotated around the center axis of the wafer placement position to The cleaning liquid placed on the wafer surface at the wafer placement position is spun off; the cleaning liquid storage device is arranged in the cleaning chamber and includes: a cleaning liquid containing wall for containing the cleaning liquid, including an inner wall and an outer wall, wherein the inner wall surface is provided with The vent hole, and the inner wall and the outer wall form a closed space; the vacuum pump, connected to the closed space, is used to vacuum the closed space so that the air pressure in the closed space is lower than the outside air pressure; the cleaning solution containment wall is arranged around the wafer placement position and the inner wall faces Wafer placement. The wafer cleaning device can prevent the cleaning liquid sputtered to the cleaning liquid containing wall from being bounced back by the cleaning liquid containing wall, and can also prevent secondary contamination of the wafer caused by the back splash of the cleaning liquid, and improve the yield rate of wafer production.

Here, we will introduce the liquid ring vacuum pump for wafer cleaning equipment. For more information about the liquid ring vacuum pump, please click to contact us.

Liquid ring vacuum pump for Wafer Cleaning Equipment

Liquid ring vacuum pump of regular maintenance

With the continuous development of vacuum equipment industry, we all know that liquid ring vacuum pump is a common vacuum equipment, because of its excellent performance. Won the majority of users love. Next, the manufacturer of liquid ring vacuum pump will introduce how to maintain the pump:

1.In the work of liquid ring vacuum pump, the operator should pay attention to check the work and lubrication of the equipment bearing. The ambient temperature is generally 20 ℃ higher than that of the equipment bearing, which should not exceed 30 ℃ ~ 35 ℃. The actual temperature of the equipment bearing should not exceed 60 ℃. The bearing parts in normal use should be oiled about 4 times a year, and should be cleaned regularly every year. Of course, the lubricating oil should be replaced.

2.During normal operation, the packing should be pressed regularly. When the packing can not meet the sealing requirement of the equipment due to wear, we need to replace it with a new one. If the mechanical seal is used, if we find that there is leakage, we need to check whether the dynamic and static rings of the mechanical seal are damaged or the auxiliary seal is aging, which requires us to pay attention to observe the use of the equipment in the process of using the equipment.

3.When there is a special sound, you can remove the pressure plate on both ends of the cover, and then check whether there is damage at both ends of the impeller, and then check whether the exhaust valve plate is abnormal.

Above we understand that the maintenance of liquid ring vacuum pump is more important. Regular maintenance of the equipment can improve the performance of the vacuum pump equipment, but also can extend the service life of the equipment.

liquid ring vacuum pump

Is the gas in liquid ring vacuum pump in contact with water?

As the name suggests, liquid ring vacuum pump needs to be in close contact with water, so many people have many questions about whether the gas in the equipment is in contact with water. Here, we can tell you that the answer is yes. Why is this so? Let’s talk about it in detail.

1.The medium inhaled by liquid ring vacuum pump must be in contact with water. If the medium is dissolved in water, you can change the working fluid of liquid ring vacuum pump, such as oil, alcohol or sulfuric acid.

2.Water jet vacuum pump suction medium is to contact with water, if the pumped medium dissolved in water, water jet pump is not suitable for use.

3.In terms of pollution production, it depends on the amount of water pollution you have treated. In terms of water consumption, the water consumption of liquid ring vacuum pump is about 1 / 5 of that of water jet pump.

4.If change other liquid to do work liquid, I suggest you use liquid ring vacuum pump, at least can reduce the cost of heat exchange

The liquid ring vacuum pump gas and water contact related issues for you to briefly introduce here, I hope you have more understanding, so as to help you better operate the equipment. At the same time, more information is welcome to follow our website at any time..

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