Vacuum pump in semiconductor etching equipment

1. Composition of semiconductor ion beam etching machine

Ion beam etching machine is composed of vacuum chamber, worktable, shutter, vacuum pumping system, air supply system, water cooling system, power supply and electrical system. When the machine works normally, firstly, the pressure of the vacuum chamber is pumped to 2 × 10-3pa or lower, and then the Ar gas flow rate is adjusted to keep the vacuum chamber pressure at 1 × 10-2 ~ 2 × 10-2Pa (if auxiliary gases such as O2 and CH2 are needed, they can be mixed with them in a certain proportion), and then start the power supply of the ion source to make the ion source work normally, After the ion beam with certain energy and density is neutralized by the electrons emitted from the neutralizer, it bombards the workpiece for sputtering etching. The mask pattern of the groove must be prepared on the surface of the workpiece. In this way, the exposed part is etched away, and the masking part is retained, thus forming the required groove pattern on the surface of the workpiece.

2. Vacuum system

There are two sets of vacuum system, which are used for pre vacuum chamber and etching chamber respectively. The pre vacuum chamber is vacuumized by mechanical pump separately. Only when the vacuum degree of the pre vacuum chamber reaches the set value, can the isolation door be opened to transport the sheet. The vacuum of etching cavity is provided by both mechanical pump and molecular pump, and the gas generated by etching reaction is also evacuated by vacuum system.

Vacuum pump in semiconductor etching equipment

Model: single stage rotary vane pump SV series

Technical parameters:

Model Pump speed (m3/h) Ultimate vacuum (Pa) Motor Power (KW) Inlet Diam (inch) Rotary speed (rpm) Oil Capacity (L) G.W(kg) Noise dB (A) Dimensions (mm)
50HZ 60HZ
SV-010 10 12 150 0.55 (3ph)0.90 (1ph) G1/2 1400 0.5 20 64 405*253*210
SV-020 20 24 150 0.75(3ph)0.90(1ph) G1/2 2800 0.5 25 64 405*253*210
SV-025 25 30 150 0.75(3ph)0.90(1ph) G1/2 2800 0.5 26 64 405*253*210
SV-040 40 48 50 1.5 G11/4 1400 1.0 48 67 660*300*270
SV-063 63 75 50 2.2 G11/4 1400 2.0 81 68 695*420*295
SV-100 100 120 50 3.0 G11/4 1400 2.0 85 72 735*420*295
SV-160 160 192 50 4.0 G2 1400 4.5 152 74 805*520*410
SV-200 200 240 50 5.5 G2 1400 4.5 159 76 825*520*410
SV-250 250 300 50 5.5 G2 1400 7.0 230 76 1000*550*410
SV-300 300 360 50 7.5 G2’’ 1400 7.0 236 76 1200*550*410
SV-630 630 750 10 15 DN100 960 35 620 75 1630*1300*980
SV-750 750 900 10 18.5 DN100 1150 35 640 76 1630*1300*980

Main features:

1. Vacuum pumps and systems for semiconductor industry

2. Scientific instruments, vacuum pump and system for vacuum processing

3. Exhaust control. Sewage treatment system, gas treatment system

4. Oil seal rotary vane pump. Product application fields: PCB board industry, semiconductor industry, CCL industry, SMT industry, photoelectric machinery, chemical industry, etc.

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